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More Indians in US turn inventors

Friday, 7 September 2007


NEW DELHI, Sep 6 (PTI): Indian immigrants in the United States are making a strong mark for themselves with an ever increasing number turning into inventors in the country, a recent study says.
According to a report prepared by a team of researchers from Harvard, Duke and New York Universities, the number of Indian nationals contributing to US international patent applications touched 5.5 per cent in 2006. This is a sharp rise compared to just 1.6 per cent in 1998.
"During this period, there was a large influx of highly educated Indians into US and they contributed immensely to the intellectual capital of American corporations and universities," Vivek Wadhwa, a fellow at the Harvard Law School and executive- in-residence at Duke University, one of the authors of the report told PTI.
Analysing the Patent Cooperation Treaty (PCT) applications from the US at the World Intellectual Property Organisation (WIPO), the researchers found contribution of inventors with Indian-heritage names increased to 13.7 per cent from 9.5 per cent during 1998-2006 period.
Besides, Indian and Chinese inventors file most patents in the fields of sanitation, medical preparations, pharmaceuticals, semiconductors and electronics.
Geographically, most of the Indian inventors chose to reside in places like California, New Jersey and Texas.
"Indian-born entrepreneurs in the US founded more engineering and technology firms (from 1995-2005) than the next immigrant groups - from UK, China, Taiwan and Japan, combined." the report revels.
The researchers also examined information published by the US Homeland Security Department, Labor Department and State Department Immigration Survey to understand the foreign-national data.
Titled 'Intellectual Property, the Immigration Backlog and a Reverse Brain-Drain, America's New Immigrant Entrepreneurs', the report also throws light on the contributions from foreign nationals and foreign residents in filing international patent applications from US.